Near-IR Two Photon Microscopy Imaging of Silica Nanoparticles Functionalized with Isolated Sensitized Yb(III) Centers

Giuseppe Lapadula (1) , Adrien Bourdolle (2, 3) , Florian Allouche (1) , Matthew Conley (1) , Iker del Rosal (4) , Laurent Maron (4) , Wayne Lukens (5) , Yannick Guyot (6) , Chantal Andraud (2) , Sophie Brasselet (7) , Christophe Copéret (1, 3) , Olivier Maury (2) , Richard Andersen

1 D-CHAB - Department of Chemistry and Applied Biosciences [ETH Zürich]
2 LC - Laboratoire de Chimie - UMR5182
3 C2P2 - Laboratoire de Chimie, Catalyse, Polymères et Procédés, R 5265
4 LPCNO - Laboratoire de physique et chimie des nano-objets
5 CSD - Chemical Sciences Division [LBNL Berkeley]
6 ILM - Institut Lumière Matière [Villeurbanne]
7 FRESNEL - Institut FRESNEL

Domains: Chemical Sciences; Inorganic chemistry; Material chemistry; Organic chemistry

Giuseppe Lapadula, Adrien Bourdolle, Florian Allouche, Matthew Conley, Iker del Rosal, et al.. Near-IR Two Photon Microscopy Imaging of Silica Nanoparticles Functionalized with Isolated Sensitized Yb(III) Centers. Chemistry of Materials, 2014, 26 (2), pp.1062-1073. ⟨10.1021/cm404140q⟩. ⟨hal-01245486⟩